材料科学
薄膜
基质(水族馆)
脉冲激光沉积
准分子激光器
复合材料
粒度
结晶度
硅
表面粗糙度
扫描电子显微镜
分析化学(期刊)
光电子学
光学
激光器
纳米技术
地质学
物理
化学
海洋学
色谱法
作者
HaiDan Wang,Yongfeng Lu,Zhihong Mai,Zhong‐Min Ren
摘要
Titanium nitride (TiN) thin films were deposited on hydrogen-terminated silicon substrates by pulsed laser ablation of a ceramic TiN target. A KrF excimer laser with a wavelength of 248 nm and pulse duration of 23 ns was used in our experiments. The vacuum chamber was maintained at a pressure of 10-5 Torr during the deposition and the substrate temperature ranged from room temperature to 600 degrees C. Nano-indentation and scanning tunneling microscopy (STM) were used to analyze the surface properties of the deposited thin films. The hardness, Young's modulus and morphology of the thin films at different substrate temperatures were investigated. The hardness of the thin films deposited at 600 degrees C was found to be as high as 26 GPa and the Young's modulus approximately 280 GPa. This can be explained by x-ray diffraction measurements. The root mean square roughness and the grain size of the thin films deposited at different substrate temperatures were measured by STM in the contact mode. The relationship between the surface morphology and the crystallinity will be discussed. The x-ray diffraction studies indicated that the grain size of the thin films increased with the substrate temperature and a high quality film can be obtained when the substrate temperature reaches 600 degrees C. Clear improvement of the film hardness and Young's modulus resulted from increasing the substrate temperature.
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