太赫兹辐射
材料科学
铋
飞秒
光学
光电流
分子束外延
光电子学
太赫兹光谱与技术
半导体
激光器
波长
激发态
图层(电子)
外延
物理
原子物理学
纳米技术
冶金
作者
J. Devenson,R. Norkus,Remigijus Juškėnas,A. Krotkus
出处
期刊:Optics Letters
[The Optical Society]
日期:2021-07-26
卷期号:46 (15): 3681-3681
被引量:3
摘要
Thinner than 10 nm layers of bismuth (Bi) were grown on (111) Si substrates by molecular beam epitaxy. Terahertz (THz) radiation pulses from these layers excited by tunable wavelength femtosecond optical pulses were measured. THz emission sets on when the photon energy exceeds 0.45 eV, which was explained by the semimetal-to-semiconductor transition at this Bi layer thickness. A THz signal has both isotropic and anisotropic components that could be caused by the lack of balance of lateral photocurrent components and the shift currents, respectively.
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