薄膜晶体管
材料科学
光电子学
频道(广播)
阈值电压
晶体管
栅极电压
无定形固体
电气工程
电压
纳米技术
结晶学
化学
图层(电子)
工程类
作者
Kazushige Takechi,Shinnosuke Iwamatsu,Toru Yahagi,Yoshiyuki Watanabe,Seiya Kobayashi,Hiroshi Tanabe
出处
期刊:ECS transactions
[The Electrochemical Society]
日期:2013-03-15
卷期号:50 (8): 139-149
被引量:4
标识
DOI:10.1149/05008.0139ecst
摘要
We discuss the dependence of bottom-gate transfer characteristics (Vbg-Id) on top-gate voltage (Vtg), which we call "top-gate effects", using a-IGZO TFTs having a dual-gate structure. We consider the top-gate effects to be a measure of how a-IGZO TFT characteristics are sensitive to charge generation on TFTs. We compare the top-gate effects in a-IGZO TFTs and conventional channel-etched a-Si:H TFTs. We found that the positive top-gate effect in a-IGZO TFTs varied depending on top-channel properties, while the negative top-gate effect had a similar impact on Vbg-Id characteristics irrespective of top-channel properties. We also found that a-IGZO TFTs had more significant top-gate effects than conventional a-Si:H TFTs.
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