Dissolution dynamics of partially protected poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solution

Abstract A 0.26 M tetramethylammonium hydroxide (TMAH) aqueous solution has been used as a standard developer for manufacturing semiconductor devices. Alternative developers have recently attracted much attention because the 0.26 M TMAH developer may be approaching its performance limit. In this study, we measured the dissolution and swelling behavior of resist polymers in tetraalkylammonium hydroxide (TAAH) aqueous solutions using a quartz crystal microbalance method to clarify the effects of the alkyl chain length of TAAH. The resist polymer was poly(4-hydroxystyrene), whose hydroxyl groups were partially protected with t -butoxycarbonyl groups. When the alkyl chain length of TAAH was increased from two (ethyl) to three (propyl), the dissolution mode markedly changed. The dissolution mode did not depend on the polymer polarity. The change in the dissolution mode is probably caused by the size effect of TAAH, considering the independence of polymer polarity and the discrete change in the dissolution mode.