硅
污染
电子显微镜
材料科学
透射电子显微镜
环境化学
纳米技术
分析化学(期刊)
化学
冶金
光学
物理
生态学
生物
出处
期刊:Ultramicroscopy
[Elsevier]
日期:2023-06-24
卷期号:253: 113797-113797
被引量:5
标识
DOI:10.1016/j.ultramic.2023.113797
摘要
Contaminant-free specimens are an essential prerequisite for high-quality electron microscopy. Silicon is the second most abundant element in the earth's crust with similar chemical properties to that of carbon. However, as a potential source of contamination, silicon has been occasionally reported but not specifically addressed in the electron microscopy community to date. This work highlights the widespread presence of silicon-containing contaminants on TEM specimens, and proposes a general solution for this type of contaminants by using SF6 as a silicon remover. After the treatment, both hydrocarbons and silicon-containing contaminants were removed and no further electron beam showering was needed for most of the specimens to achieve time-invariant imaging. It is expected that this method could be beneficial not only for electron microscopes but also for other surface-sensitive analytical instruments.
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