塔菲尔方程
过电位
催化作用
电催化剂
材料科学
掺杂剂
兴奋剂
氮化物
交换电流密度
尿素
化学工程
化学
无机化学
纳米技术
电极
物理化学
电化学
光电子学
有机化学
工程类
图层(电子)
作者
Wenquan Wang,Yalong Shao,Zhikai Wang,Zijing Yang,Zhen Zhen,Zhonghua Zhang,Changming Mao,Xiaosong Guo,Guicun Li
标识
DOI:10.1002/celc.202000072
摘要
Abstract Unraveling the effect of metal doping on the intrinsic activity of metal nitride remains a grand challenge. Herein, Ru (Rh)‐doped vanadium nitride are successfully synthesized via a simple soft‐urea pathway. In comparison, the Ru‐doped VN electrocatalyst exhibits much better HER performance than Rh‐doped VN electrocatalysts. The optimal Ru‐VN catalyst delivers a low overpotential of 134 (144) mV at current density of 10 mA cm −2 , and a low Tafel slope of 35 (73) mV dec −1 in acidic (alkaline) condition. Such excellent performance can be attributed to the unique synergetic effect between Ru and VN. Moreover, moderate Ru dopant can effectively promote the HER kinetics of VN, resulting in mechanism transformation of hydrogen evolution from Volmer‐Heyrovsky to Volmer‐Tafel route, especially in acidic condition. This simple and facile strategy can be utilized to fabricate a series of Ru‐doped nitrides, which can be applied in energy conversion fields.
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