石墨氮化碳
光催化
纳米技术
氮化碳
材料科学
环境修复
表面改性
氮化物
碳纤维
生化工程
催化作用
化学工程
化学
有机化学
工程类
图层(电子)
复合数
复合材料
生态学
污染
生物
作者
Tao Zhong,Wenbin Huang,Zhangnan Yao,Xianhu Long,Wei Qu,Huinan Zhao,Shuanghong Tian,Dong Shu,Chun He
出处
期刊:Small
[Wiley]
日期:2024-08-18
被引量:1
标识
DOI:10.1002/smll.202404696
摘要
Abstract Graphitic carbon nitride (g‐C 3 N 4 ) is a prominent photocatalyst that has attracted substantial interest in the field of photocatalytic environmental remediation due to the low cost of fabrication, robust chemical structure, adaptable and tunable energy bandgaps, superior photoelectrochemical properties, cost‐effective feedstocks, and distinctive framework. Nonetheless, the practical application of bulk g‐C 3 N 4 in the photocatalysis field is limited by the fast recombination of photogenerated e − ‐h + pairs, insufficient surface‐active sites, and restricted redox capacity. Consequently, a great deal of research has been devoted to solving these scientific challenges for large‐scale applications. This review concisely presents the latest advancements in g‐C 3 N 4 ‐based photocatalyst modification strategies, and offers a comprehensive analysis of the benefits and preparation techniques for each strategy. It aims to articulate the complex relationship between theory, microstructure, and activities of g‐C 3 N 4 ‐based photocatalysts for atmospheric protection. Finally, both the challenges and opportunities for the development of g‐C 3 N 4 ‐based photocatalysts are highlighted. It is highly believed that this special review will provide new insight into the synthesis, modification, and broadening of g‐C 3 N 4 ‐based photocatalysts for atmospheric protection.
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