CsPbBr3 QD/AlOx Inorganic Nanocomposites with Exceptional Stability in Water, Light, and Heat

Abstract Herein, the assembly of CsPbBr 3 QD/AlO x inorganic nanocomposites, by using atomic layer deposition (ALD) for the growth of the amorphous alumina matrix (AlO x ), is described as a novel protection scheme for such QDs. The nucleation and growth of AlO x on the QD surface was thoroughly investigated by miscellaneous techniques, which highlighted the importance of the interaction between the ALD precursors and the QD surface to uniformly coat the QDs while preserving the optoelectronic properties. These nanocomposites show exceptional stability towards exposure to air (for at least 45 days), irradiation under simulated solar spectrum conditions (for at least 8 h), and heat (up to 200 °C in air), and finally upon immersion in water. This method was extended to the assembly of CsPbBr x I 3− x QD/AlO x and CsPbI 3 QD/AlO x nanocomposites, which were more stable than the pristine QD films.