Thermoelectric performance of restacked MoS2nanosheets thin-film

MoS2 has been predicted to be an excellent thermoelectric material due to its large intrinsic band gap and high carrier mobility. In this work, we exfoliated bulk MoS2 by the assistance of lithium intercalation and fabricated the restacked MoS2 thin-film using a simple filtration technique. These MoS2 thin-films with different thickness showed different thermoelectric performance. It was found that with the increase of thickness, carrier concentration, electrical conductivity and Seebeck coefficient all showed an increasing trend. In particular, the maximum Seebeck coefficient was able to reach 93.5 μV K(-1). This high thermopower indicates that MoS2 will have ideal thermoelectric performance in the future through optimizing its structure. The highest figure of merit (ZT = 0.01) is calculated in this experiment.