材料科学
通量
硅
飞秒
氧化物
分层(地质)
基质(水族馆)
激光器
辐照
复合材料
氧化硅
光电子学
光学
冶金
核物理学
氮化硅
俯冲
构造学
生物
古生物学
地质学
物理
海洋学
作者
Joel P. McDonald,Vanita R. Mistry,Katherine Ray,S. M. Yalisove,J. Nees,Neville Reid Moody
摘要
Silicon (100) substrates with thermal oxide films of varying thickness were irradiated with single and multiple 150fs laser pulses at normal and non-normal incidences. A range of laser fluence was found in which a blister or domelike feature was produced where the oxide film was delaminated from the substrate. At normal and non-normal incidences blister features were observed for samples with 54, 147, and 1200nm of thermal oxide. The blister features were analyzed with optical and atomic force microscopy. In addition, the time frame for blister growth was obtained using pump-probe imaging techniques.
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