材料科学
X射线光电子能谱
立方氧化锆
热重分析
吸收(声学)
带隙
分析化学(期刊)
吸收光谱法
差示扫描量热法
电子顺磁共振
化学工程
陶瓷
光电子学
复合材料
核磁共振
化学
有机化学
光学
物理
工程类
热力学
作者
Behnam Dashtbozorg,F. Shi,Alberto Tagliaferro,Stephen Abela,Lucian Falticeanu,Hanshan Dong
出处
期刊:Acta Materialia
[Elsevier]
日期:2023-10-21
卷期号:262: 119457-119457
被引量:5
标识
DOI:10.1016/j.actamat.2023.119457
摘要
Oxygen-deficient zirconia (ZrO2-x) has recently emerged as a promising material for light absorption and photocatalytic applications. However, the economic and environmentally friendly manufacture of bulk ZrO2-x remains challenging and has limited widespread adoption. In this study, we present a novel low-pressure (300 Pa) plasma treatment (H2 gas at 500°C for 5 hours) capable of producing fully-dense bulk ZrO2-x without significant structural modifications. EPR (electron paramagnetic resonance) and XPS (X-ray photoelectron spectroscopy) characterisation of the plasma treated zirconia indicate the formation of Zr3+ ions and F2+ (VO··) centres. The increase of oxygen vacancies is also supported by the greater exothermic heat flow and relative mass gain observed through TGA (thermogravimetric analysis) and DSC (differential scanning calorimetry) analyses. Diffuse reflectance spectroscopy (DRS) reveals a substantial enhancement in light absorption, with an average increase of 66.2% and >65% absolute absorption across the entire spectrum (200-3000 nm). XPS and DRS measurements suggest significant reduction in both direct (from 4.84 to 2.61 eV) and indirect (from 3.19 to 1.45 eV) bandgap transition. By effectively enhancing the light absorption capability, reducing bandgap transitions, and maintaining the structural integrity of zirconia, low-pressure plasma treatments offer a promising and scalable approach for the environmentally friendly production of next-generation ZrO2-x materials.
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