材料科学
基质(水族馆)
显微镜
半导体器件
光学显微镜
半导体
光电子学
显微镜
图层(电子)
光学
纳米技术
扫描电子显微镜
复合材料
物理
地质学
海洋学
作者
Cheng-Hsin Liu,Yu‐Hsiang Hsiao,Yi‐Sheng Lin
标识
DOI:10.1109/impact53160.2021.9697004
摘要
This paper describes the non-destructive imaging using 3D X-ray microscopy (XRM) for Semiconductor Embedded in Substrate (SESUB) failure analysis. XRM is able to generate 3D views and 2D virtual images, such as via and layout of each layer of the circuit. [1] Three cases are explained how to identify and locate failures embedded deep inside the SEUB with 3D XRM, such as a trace broken, micro via (m-VIA) poor-opening within a SESUB package. [2]
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