Nanostructured Cu-doped TiO2 with photothermal effect for prevention of implant-associated infection

Bacterial infection of titanium (Ti) dental implants is still a major clinical complication. In this study, a combination of copper (Cu) ions and photothermal therapy is used to combat implant-associated infection. Cu doped TiO2 (TiO2-Cu) films were prepared on Ti by magnetron sputtering and subsequently annealing. TiO2-Cu films had efficient photothermal conversion ability due to the generated nanostructure during the annealing process. Under the irradiation of 808 near infrared light, the combined actions of hyperthermia and Cu ions gave rise to excellent antibacterial activity against Streptococcus mutans on Ti as demonstrated by the experiments conducted in vitro and in vivo. The TiO2-Cu films also exhibited excellent biocompatibility. In addition, the surface hardness and corrosion resistance of TiO2-Cu films were greatly improved.