Silicon–Lithium Niobate Hybrid Intensity and Coherent Modulators Using a Periodic Capacitively Loaded Traveling-Wave Electrode

High-performance silicon and thin-film lithium niobate hybrid electro-optic modulators are demonstrated. In order to break the voltage–bandwidth limit in a normal traveling-wave modulator, a periodic capacitively loaded traveling-wave electrode is employed in this hybrid platform. The silicon substrate is undercut-etched to achieve index matching of the optical wave and microwave. A hybrid waveguide with a lithium niobate thin film bonded on a silicon wire is employed. Lithium niobate etching is not required for making the hybrid optical waveguides. We realize an intensity modulator of 12.5 mm long modulation section, which exhibits a low half-wave voltage of 1.7 V and a large 3 dB modulation bandwidth of >70 GHz. Data transmissions with various modulation formats beyond 100 Gbit/s are successfully achieved with dynamic extinction ratios of >8 dB. Combining the advantages of the silicon and thin-film lithium niobate platforms, a compact dual polarization coherent modulator is also experimentally demonstrated, on which 96 Gbaud 16-level quadrature amplitude modulation signals in both polarizations are successfully transmitted.