基质(水族馆)
材料科学
光学(聚焦)
蚀刻(微加工)
聚焦离子束
静态随机存取存储器
过程(计算)
透射电子显微镜
光电子学
计算机科学
电子工程
复合材料
纳米技术
工程类
光学
离子
化学
物理
地质学
有机化学
操作系统
海洋学
图层(电子)
作者
Yu Shu,Chun Chen,Jenq-Wen Huang,Song Gang
出处
期刊:International Symposium on the Physical and Failure Analysis of Integrated Circuits
日期:2013-07-15
被引量:1
标识
DOI:10.1109/ipfa.2013.6599225
摘要
In this paper, we focus on how to identify the influence of device cause by substrate damage issue via nanoprobing analysis, and inferring that the equivalent mathematical models was application to describe the corresponding electrical data in a device with substrate damage issue. A case study was presented to verify that poor Poly etching process control caused substrate damage issue, and this issue can be identified via physical failure analysis (PFA) method (e.g. Transmission Electron Microscope (TEM) and Focus Ion Beam (FIB) techniques) and nanoprobing analysis method.
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