石墨烯
异质结
材料科学
纳米技术
氮化硼
之字形的
纳米电子学
六方氮化硼
电介质
光电子学
几何学
数学
作者
Qiucheng Li,Mengxi Liu,Yanfeng Zhang,Zhongfan Liu
出处
期刊:Small
[Wiley]
日期:2015-10-06
卷期号:12 (1): 32-50
被引量:134
标识
DOI:10.1002/smll.201501766
摘要
Research on in-plane and vertically-stacked heterostructures of graphene and hexagonal boron nitride (h-BN) have attracted intense attentions for energy band engineering and device performance optimization of graphene. In this review article, recent advances in the controlled syntheses, interfacial structures, and electronic properties, as well as novel device constructions of h-BN and graphene heterostructures are highlighted. Firstly, diverse synthesis approaches for in-plane h-BN and graphene (h-BN-G) heterostructures are reviewed, and their applications in nanoelectronics are briefly introduced. Moreover, the interfacial structures and electronic properties of h-BN-G heterojunctions are discussed, and a zigzag type interface is found to preferentially evolve at the linking edge of the two structural analogues. Secondly, several synthetic routes for the vertically-stacked graphene/h-BN (G/h-BN) heterostructures are also reviewed. The role of h-BN as perfect dielectric layers in promoting the device performance of graphene is presented. Finally, future research directions in the synthesis and application of such heterostructures are discussed.
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