硅
材料科学
GSM演进的增强数据速率
光电子学
计算机科学
电信
作者
Puzant Baliozian,Elmar Lohmüller,Tobias Fellmeth,Armin Richter,Anna Münzer,Akshay Bhandary,Nico Wöhrle,Alma Spribille,R. Preu
标识
DOI:10.1109/pvsc45281.2020.9300828
摘要
We present results in post-metallization "passivated edge technology" (PET) and its application on bifacial p-type silicon shingle solar cells. Host cells (full cells with shingle metallization layout after contact firing) separated by either thermal laser separation (TLS) or conventional laser scribe and mechanical cleave (LSMC) show similar drops in pseudo fill factor pFF of -1.2 % abs , After PET, the TLS-separated cells regain 50 % rel of the pFF-drop, i.e. ApFF = +0.6 % abs , while the LSMC-separated ones regain 17 % rel in pFF after PET, i.e. ApFF = +0.2 % abs . Bifacial shingle solar cells processed with TLS and PET attain a peak designated area output power density of 23.5 mW/cm 2 that is 0.4 mW/cm 2 higher than a LSMC-separated shingle cell without PET (considering 100 W/ m2 irradiance from the rear side). The PET leads to improved cell results after separation into shingle cells. The edge passivation is most effective when applied on cells with TLS-separated and thus smooth edges.
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