多晶硅
硅
激光器
饱和电流
太阳能电池
接触电阻
光电子学
氧化物
材料科学
光学
激光烧蚀
图层(电子)
饱和(图论)
等效串联电阻
电压
纳米技术
电气工程
物理
冶金
数学
薄膜晶体管
工程类
组合数学
作者
Felix Haase,Christina Hollemann,Sören Schäfer,Agnes Merkle,Michael Rienäcker,Jan Krügener,Rolf Brendel,Robby Peibst
标识
DOI:10.1016/j.solmat.2018.06.020
摘要
We demonstrate damage-free laser contact openings in silicon oxide layers on polycrystalline silicon on oxide (POLO) passivating contacts. A pulsed UV-laser evaporates the upper part of the polycrystalline silicon layer, lifting off the silicon oxide layer on top. On n-type POLO (and p-type POLO, respectively) samples a saturation current density of 2 fA cm−2 (6 fA cm−2) and an implied open-circuit voltage of 733 mV (727 mV) are achieved with a laser contact opening area fraction of 12.3% (8.7%). The application of this ablation process in an interdigitated back contact solar cell leads to an independently confirmed power conversion efficiency of 26.1%. The excellent contact quality of the laser contact openings is proven by the low series resistance of 0.1 Ω cm2 on the solar cell with a contact area of only 3%.
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