化学
反应速率常数
降级(电信)
氯化物
过硫酸盐
环境化学
核化学
腐植酸
无机化学
动力学
有机化学
催化作用
物理
电信
量子力学
肥料
计算机科学
作者
Nguyen Tien Hoang,Tran Duc Manh,NC Thuy Tram,Bui Dinh Nhi,Fredrick M. Mwazighe,Dinh Van Tac,Vu Thi Duyen,Hien Y Hoang,Nguyen Thi Thy Nga,Doan Van Duong,L. Tran Thi,Thi Van Doan
标识
DOI:10.1016/j.jece.2023.111846
摘要
This work comprehensively studied the kinetic degradation of ciprofloxacin (CIP), levofloxacin (LEV), and sulfanilamide (SAA) by UV/PS/Cl and UV/H2O2/Cl. UV contributed to the degradation of SAA to a great extent, resulting in the highest degradation, compared with the other PPCPs. 10 mM of Cl- slightly enhanced the degradation of LEV and SAA, while higher concentrations of Cl- (up to 1000 mM) inhibited the degradation of all the PPCPs in most processes. Increasing the concentration of Cl- to 1000 mM resulted in the decrease in the concentrations of •OH (which decreased by 88 – 96%) and SO4•- (which decreased by 67.4%) in UV/PS/Cl. With the increase in the concentration of Cl- to 1000 mM, the contributions of •OH and SO4•- to the degradation of the PPCPs were almost completely masked by the contribution of Cl• (except in the case of SAA). The relationship between the natural logarithms of the second-order rate constant of SO4•- and Cl• with PPCPs versus the Hammett constant was established and used to determine the second-order rate constant of SAA towards SO4•-. Acidic pH and neutral pH were conducive for the degradation of the PPCPs in the process. The presence of various constituents, including anions (i.e., HCO3-, SO42-, and NO3-) and metal cations (i.e., Fe2+, Ni2+, Co2+ and Mn2+) inhibited the degradation rate of the PPCPs to varying degrees. In the presence of 10 mM Cl- and other anions, •OH and SO4•- were consumed by Cl-, up to 71 – 90% and 8 – 10% in UV/PS/Cl, respectively. Toxicity assessment showed that 10 mM Cl- in UV/PS/Cl and UV/H2O2/Cl did not cause any significant inhibition on the growth of Chlorella vulgaris and Escherichia coli (E.Coli), compared with that in the absence of Cl-. In summary, Cl• is an important radical that can replace •OH and SO4•- in UV/PS or UV/H2O2 under saline conditions.
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