材料科学
光刻胶
图层(电子)
平版印刷术
沉积(地质)
铝
纳米技术
原子层沉积
光电子学
复合材料
古生物学
沉积物
生物
作者
Xingkun Wang,Taoli Guo,Yiyang Shan,Ou Zhang,Hong Dong,Jincheng Liu,Feng Luo
摘要
Al-based dry photoresists synthesized by molecular layer deposition (MLD) have good resolution and excellent etch resistance, so their application in photolithography is very promising.
科研通智能强力驱动
Strongly Powered by AbleSci AI