氮化硅
高功率脉冲磁控溅射
表征(材料科学)
材料科学
硅
沉积(地质)
光电子学
溅射沉积
溅射
纳米技术
薄膜
氮化硅
地质学
沉积物
古生物学
作者
Bo-Huei Liao,Chien‐Nan Hsiao,Ming Hua Shiao,Shih-Hao Chan,Sheng‐Hui Chen,Sheng-De Weng
标识
DOI:10.1364/oic.2019.wd.2
摘要
In this research, silicon oxynitride films were prepared by high-power impulse magnetron sputtering. The transmittance of SiON films increased from 13.6% to 88.9% at 215 nm after introducing 2.2 sccm O2 gas. The extinction coefficient was smaller than 1×10–3 from 250nm to 700nm. The average transmittance of the SiON films on the glass in the visible range was 86 % and its hardness was 24 Gpa as introducing 2 sccm O2 gas.
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