电化学
溶解
材料科学
过电位
离子
电化学动力学
扩散
电解质
腐蚀
电解
化学工程
阴极
标识
DOI:10.1016/0013-4686(84)87083-8
摘要
Abstract The influence of Cl(I)− ions on kinetics and mechanism of anodic dissolution and cathodic deposition of copper in acidic sulfate was investigated. For this investigation the galvanostatic single-pulse method has been used. The results indicate that Cl(I)− ions change the exchange current density and transfer coefficients as determined from tafel analyses of the anodic and cathodic reactions.
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