化学气相沉积
等离子体
微波食品加热
甲烷
分析化学(期刊)
氢
化学
气体放电
离子源
等离子体处理
材料科学
原子物理学
有机化学
量子力学
电气工程
物理
工程类
作者
С. А. Богданов,A. L. Vikharev,А. М. Горбачев,D.B. Radishev,M. A. Lobaev
标识
DOI:10.1002/ppap.202300073
摘要
Abstract A new form of microwave discharge with a filament inside plasma volume was investigated in a microwave plasma‐assisted chemical vapor deposition (CVD) reactor. The threshold values of methane content in a hydrogen–methane gas mixture, gas pressure, and microwave power for discharge transition to the new form were found. The parameters' range of existence of the new form of discharge was investigated in three types of CVD reactors. Measurements of the electron density, gas temperature, and spatial distributions of the plasma optical emission lines intensity were carried out for both forms of the discharge. The reasons for the transition of the discharge to a new form and the possibility of using the new discharge form in the microwave plasma‐assisted (MPA) CVD reactor are discussed.
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