材料科学
光电子学
阳极
氧化铟锡
暗电流
电极
活动层
光电探测器
带隙
兴奋剂
多波段设备
图层(电子)
纳米技术
薄膜晶体管
电气工程
物理
工程类
量子力学
天线(收音机)
作者
Xingchao Zhao,Ming Liu,Jian Wang,Kaixuan Yang,Haolan Zhang,Sang Young Jeong,Fujun Zhang,Han Young Woo,Fujun Zhang
标识
DOI:10.1021/acsami.4c05558
摘要
A series of dual-band photomultiplication (PM)-type organic photodetectors (OPDs) were fabricated by employing a donor(s)/acceptor (100:1, wt/wt) mixed layer and an ultrathin Y6 layer as the active layers, as well as by using PNDIT-F3N as an interfacial layer near the indium tin oxide (ITO) electrode. The dual-band PM-type OPDs exhibit the response range of 330–650 nm under forward bias and the response range of 650–850 nm under reverse bias. The tunable spectral response range of dual-band PM-type OPDs under forward or reverse bias can be explained well from the trapped electron distribution near the electrodes. The dark current density (JD) of the dual-band PM-type OPDs can be efficiently suppressed by employing PNDIT-F3N as the anode interfacial layer and the special active layers with hole-only transport characteristics. The light current density (JL) of the dual-band PM-type OPDs can be slightly increased by incorporating wide-bandgap polymer P-TPDs with relatively large hole mobility (μh) in the active layers. The signal-to-noise ratios of the optimized dual-band PM-type OPDs reach 100,980 under −50 V bias and white light illumination with an intensity of 1.0 mW·cm–2, benefiting from the ultralow JD by employing wide-bandgap PNDIT-F3N as the anode interfacial buffer layer and the increased JL by incorporating appropriate P-TPD in the active layers.
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