材料科学
氧化应激
半胱氨酸
吸收(声学)
碳纤维
吸收光谱法
光化学
化学工程
生物化学
复合材料
化学
酶
光学
复合数
物理
工程类
作者
Ce Chen,Lidong Yu,Xueting Li,Zewen Yu,Danjie Song,Siqi Wang,Fangshun Li,Shanshan Jiang,Yajie Chen,Jucai Xu,Jianglin Fan,Bingsheng Li,Li Li
标识
DOI:10.1021/acsami.4c02955
摘要
Ultraviolet (UV) exposure causes damage to human skin and mucous membranes, resulting in oxidative stress, and can also lead to inflammation of human skin, skin aging, and even diseases such as squamous cell carcinoma and melanoma of the skin. The main means of protection against UV radiation is physical shielding and the use of sunscreen products. Carbon dots as a novel nanomaterial provide a new option for UV protection. In this article, we introduced sulfhydryl groups to synthesize l-cysteine-derived carbon dots (GLCDs) with UV resistance. GLCDs exhibit high-efficiency and excellent UV absorption, achieving 200-400 nm UV absorption (99% UVC, 97% UVB, and 86% UVA) at a low concentration of 0.5 mg/mL. Meanwhile, GLCDs can reduce apoptosis and UVB-induced oxidative damage, increase collagen type I gene expression, and inhibit skin aging in zebrafish. It also inhibits senescence caused by the senescence inducer 2,2'-azobis(2-methylpropionamidine) dihydrochloride and reduces oxidative damage. The above studies show that GLCDs possess efficient broad-spectrum UV absorption, antiphotoaging, and antiaging capabilities, which will have a broad application prospect in UV protection.
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