直接结合
阳极连接
材料科学
粘结强度
热压连接
复合材料
空隙(复合材料)
冶金
结晶学
化学
图层(电子)
硅
作者
Kai Cheng Shie,Jing-Ye Juang,Chih Chen
标识
DOI:10.7567/1347-4065/ab5697
摘要
Cu-to-Cu direct bonding was successfully achieved in 10 s with 〈111〉-oriented nanotwinned Cu (nt-Cu) bumps in ambient N2. The bonding temperature and pressure were 300 °C and 90 MPa, respectively. A nearly void-free interface and a low bump resistance of 4.9 mΩ can be observed after a short-time bonding process. Besides, longer bonding times of 60 s and 30 s were employed, but the resistances of the Cu joints did not decrease significantly when the bonding time increased to 60 s. However, the nt-Cu columnar grains started to recrystallize during the 60 s bonding and started detwinning in 10 s bonding. Yet, the bonding interface remained under such a short bonding time.
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