原子层沉积
沉积(地质)
等离子体
材料科学
图层(电子)
纳米技术
计算机科学
光电子学
物理
古生物学
量子力学
沉积物
生物
作者
Sami Sneck,Mikko Söderlund,Markus Bosund,P. Soininen
标识
DOI:10.1109/cstic.2017.7919810
摘要
Atomic Layer Deposition (ALD) is well known for its high film quality and high conformality, but limited by the low deposition rate. Beneq proposes a novel approach using Rotary Spatial Plasma Enhanced ALD process, which can reach deposition rates 10× higher than traditional pulsed ALD. This technology also enables use of PEALD in batch mode with high throughput. This paper describes the technology in more details.
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