纳米孔
材料科学
光电子学
发光二极管
蚀刻(微加工)
多孔性
图层(电子)
波长
纳米技术
复合材料
作者
Xingdong Lü,Jing Li,Kang Su,Chang Chun Ge,Zhicong Li,Teng Zhan,Guohong Wang,Jinmin Li
出处
期刊:Nanomaterials
[MDPI AG]
日期:2019-06-06
卷期号:9 (6): 862-862
被引量:14
摘要
A 365-nm UV LED was fabricated based on embedded nanoporous AlGaN distributed Bragg reflectors (DBR) by electrochemical etching. The porous DBR had a reflectance of 93.5% at the central wavelength of 365 nm; this is the highest value of porous AlGaN DBRs below 370 nm which has been reported so far. An innovative two-step etching method with a SiO2 sidewall protection layer (SPL) was proposed to protect the n-AlGaN layer and active region of UV LED from being etched by the electrolyte. The DBR-LED with SPL showed 54.3% improvement of maximal external quantum efficiency (EQE) and 65.7% enhancement of optical power at 100 mA without any degeneration in electrical properties, compared with the un-etched standard LED sample. This work has paved the way for the application of electrically-pumped UV LEDs and VCSELs based on nanoporous AlGaN DBRs.
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