缓冲器(光纤)
材料科学
图层(电子)
光电子学
氨
复合材料
化学
计算机科学
电信
有机化学
作者
Duan Huantao,Yue Hao,Jincheng Zhang
出处
期刊:Journal of Semiconductors
[IOP Publishing]
日期:2009-09-01
卷期号:30 (9): 093001-093001
被引量:2
标识
DOI:10.1088/1674-4926/30/9/093001
摘要
The effect of a high temperature AlN buffer layer grown by the initially alternating supply of ammonia (IASA) method on AlGaN/GaN heterostructures was studied. The use of AlN by the IASA method can effectively increase the crystalline quality and surface morphology of GaN. The mobility and concentration of 2DEG of AlGaN/GaN heterostuctures was also ameliorated.
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