钒
材料科学
薄膜
兴奋剂
外延
分析化学(期刊)
掺杂剂
蓝宝石
钼
基质(水族馆)
结晶学
光学
化学
激光器
光电子学
冶金
纳米技术
物理
海洋学
图层(电子)
色谱法
地质学
作者
Zhaopeng Wu,A. Miyashita,S. Yamamoto,Hiroyuki Abé,I. Nashiyama,Kazumasa Narumi,H. Naramoto
摘要
Molybdenum (Mo) doped vanadium dioxide thin films were synthesized using a Mo striped vanadium (V) target during pulsed laser ablation process. The film structure was characterized by high resolution x-ray diffraction, x-ray rocking curve and Rutherford backscattering/channeling measurements. The results show that the full width at half magnitude of the x-ray rocking curve is as narrow as 0.0074°, comparable to that of the (0001) sapphire substrate, 0.0042°, in this study. The ratio of the aligned-to-random backscattered yield reaches 5%, implying that the growth is that of the single crystalline epitaxy. The result of angular scans for both V and Mo atomic channelings reveals that Mo atoms successfully take sites of the V sublattice as a substitutional dopant. It has been noted that the degradation of the phase transition properties of the film upon doping is closely related to the conductivity in the semiconductor phase.
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