电磁屏蔽
电磁干扰
材料科学
电磁干扰
光电子学
透射率
截止频率
透明度(行为)
导电体
电磁频谱
宽带
光学
电气工程
计算机科学
复合材料
物理
工程类
计算机安全
作者
Yuanlong Liang,Xianjun Huang,Jisheng Pan,Wencong Liu,Kui Wen,Duocai Zhai,Peng Shang,Peiguo Liu
标识
DOI:10.1002/admt.202201532
摘要
Abstract While functional materials with both light transmitting and electromagnetic shielding are highly desirable and have made rapid advancements, only very few of them meet the stringent electromagnetic interference (EMI) shielding criteria for optoelectronic systems. Achieving high optical transparency and superior EMI shielding in a broad frequency spectrum is a remaining challenge in both academic and industrial areas. Herein, a design strategy of shorted micro‐waveguides (SMWs) array to decouple the light transmission and EMI shielding is proposed and experimentally demonstrated. The array of SMWs, consisting of cutoff metallic micro‐waveguides and shorting indium tin oxide (ITO) continuous conductive film, exhibits high optical transmittance of 90.4% and superior EMI shielding effectiveness of 60.8 dB on average over ultra‐wide frequency spectrum (0.2–1.3 GHz & 1.7–18 GHz). Compared to previously reported works, an improvement of 17 dB in average shielding effectiveness is achieved under the same level of light transmission, and the shielding frequency spectrum is significantly expanded. The working principle is explained in depth and factors influencing the performance are investigated for design optimization. These outstanding properties enable the transparent shielding material based on SMWs to excel in future applications of EMI shielding for optoelectronic systems.
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