高电子迁移率晶体管
光电子学
电致发光
材料科学
肖特基二极管
晶体管
电气工程
二极管
图层(电子)
纳米技术
电压
工程类
作者
Sirui Feng,Hang Liao,Tao Chen,Junting Chen,Yan Cheng,Mengyuan Hua,Zheyang Zheng,Kevin J. Chen
标识
DOI:10.1109/led.2023.3301966
摘要
Electroluminescence (EL) of a Schottky-type ${p}$ -GaN gate double-channel (DC-) GaN high-electron-mobility transistor (HEMT) was investigated to understand the mechanism of the carrier dynamics in the gate stack. This work revealed the unique bipolar carrier injection dynamics in the DC-HEMT under forward gate bias by analyzing the EL characteristics with bias and temperature dependence. Compared to a conventional single-channel (SC-) HEMT, the AlN insertion layer (AlN-ISL) in DC-HEMT plays the role of a blocking layer to the holes injected from gate to channel and creates a hole-storage effect that effectively suppresses the channel-to-gate electron spillover at forward gate bias.
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