Chip-scale dispersion engineering using chirped vertical gratings

A strongly coupled, chirped Bragg grating made by sinusoidally modulating the sidewalls of a silicon waveguide is designed, fabricated, and experimentally characterized. By varying the device parameters, the operating wavelength, device bandwidth, sign (normal or anomalous), and magnitude of group-velocity dispersion may be engineered for specific photonic applications. Asymmetric Blackman apodization is best suited for maximizing the useable bandwidth while providing good ripple suppression. Dispersion values up to 7.0 x 10(5) ps/nm/km are demonstrated at 1.55 microm.