光催化
卤素
兴奋剂
材料科学
罗丹明B
带隙
光降解
催化作用
塔菲尔方程
X射线光电子能谱
光化学
化学工程
物理化学
化学
光电子学
有机化学
电化学
工程类
电极
烷基
作者
Wenliang Liu,Kai Qi,Yan Wang,Fushan Wen,Jiqian Wang
标识
DOI:10.1016/j.apsusc.2022.154160
摘要
Element doping is an effective technique to modulate bandgap and improve activity of catalysts. The halogen elements (F, Cl, Br and I) doped Bi2WO6 (F-BWO, Cl-BWO, Br-BWO and I-BWO) were successfully prepared through a simple one-step microwave-assisted solvothermal strategy. The effects of F, Cl, Br and I doping on the crystal structure, morphology, photoelectric and physicochemical properties of the as-prepared samples have been investigated by XRD, SEM, FT-IR, XPS, BET, DRS, PL, EIS, and Tafel. The photocatalytic activity of all the doped samples were improved to varying degrees. Among them, the I-BWO showed the best photocatalytic hydrogen (H2) production (82.53 μmol g-1h−1) and rhodamine B (RhB) photodegradation (99%, 40 min) activities. According to the DFT (density functional theory) calculation, the bandgap regulation effect of halogen on the as-fabricated samples has been confirmed, and the photocatalytic mechanism of the doped catalysts has been discussed. This work systematically discussed the morphology-inducting effect of halogen on Bi2WO6, providing a one-step strategy for designing highly active photocatalysts.
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