Spectral analysis overlay measurement approach for improvement of overlay accuracy in advanced integrated circuits

Overlay metrology plays a significant role in process and yield control for integrated circuit (IC) manufacturing. As the On-Product Overlay (OPO) in advance nodes is reduced to a few nanometers, a very small margin is left for measurement inaccuracy. We introduce a multi-wavelength (spectral) analysis and measurement method, capable of characterizing overlay inaccuracy signatures on the wafer, and quantifying and removing the inaccuracy portion of the overlay measurement, resulting in a more accurate measurement, better process control, and yield enhancement. This method was applied to SK hynix’s advanced process production wafers, demonstrating an enhancement in accuracy over single-wavelength based overlay measurements.