结晶度
材料科学
拉曼光谱
薄膜
基质(水族馆)
溅射
溅射沉积
发光
腔磁控管
锌
光电子学
石英
分析化学(期刊)
纳米技术
光学
化学
冶金
复合材料
海洋学
色谱法
地质学
物理
作者
Sukhvinder Singh,R.S. Srinivasa,S.S. Major
标识
DOI:10.1016/j.tsf.2007.03.168
摘要
Zinc Oxide films were deposited on quartz substrates by reactive rf magnetron sputtering of zinc target. The effect of substrate temperature on the crystallinity and band edge luminescence has been studied. The films deposited at 300 °C exhibited the strongest c-axis orientation. AFM and Raman studies indicated that the films deposited at 600 °C possess better overall crystallinity with reduction of optically active defects, leading to strong and narrow PL emission.
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