钻石
化学气相沉积
人造金刚石
纳米技术
工程物理
材料科学
工艺工程
工程类
冶金
作者
Michael Schwander,K. Partes
标识
DOI:10.1016/j.diamond.2011.08.005
摘要
Diamond has some of the most extreme mechanical, physical and chemical properties of all materials. Within the last 50 years, a wide variety of manufacturing methods have been developed to deposit diamond layers under various conditions. The most common process for diamond growth is the chemical vapor deposition (CVD). Starting from the first publications until the latest results today, a range of different developments can be seen. Comparing the basic conditions and the process parameters of the CVD techniques, the technical limitations are shown. Processes with increased pressure, flow rate and applied power are the general tendency.
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