Mechanical properties of RF-sputtering MoS2thin films

We present an evaluation of the hardness and Young's modulus properties of medium pressure sputtered molybdenum disulfide (MoS2) thin films by applying nano-indentation with continuous stiffness method combined with microstructure analysis using small angle x-ray diffraction, Raman, and an electron microscope in scanning and transmission mode. Our results indicate a vertical growth of MoS2 crystallites with stacking values of 7-laminates along the [0 0 1] direction and an average height of 105 nm, principal Raman vibrations at at 378 cm−1 and A1g at 407 cm−1 and an interplanar distance of ~0.62 nm as confirmed by high-resolution transmission electron microscopy. An average hardness of H = 10.5 ± 0.1 GPa and elastic modulus of E = 136 ± 2 GPa from 0 to 90 nm of indenter penetration were found in these investigations.