Simulation of Mixing at Mo/Si Interfaces

Soft x-ray projection lithography is a rapidly emerging technology which will have enormous impact on the microelectronics industry, by providing faithful image reduction to a minimum feature size below 1000Å. 1 X-ray reduction cameras have already been designed and tested, 2 , 3 but the successful development of this new technology will depend heavily upon the production of efficient, durable x-ray optics 1 .