材料科学
微型多孔材料
化学稳定性
介孔材料
化学工程
相容性（地球化学）
分析化学（期刊）
复合材料
有机化学
工程类
催化作用
化学
作者
Els Kesters,Quoc Toan Le,Mikhaı̈l R. Baklanov,Werner Boullart,Paul Mertens
出处
期刊：Solid State Phenomena
日期：2005-04-01
卷期号：103-104: 349-352
被引量：3
标识
DOI：10.4028/www.scientific.net/ssp.103-104.349
摘要
The compatibility of chemical solutions with different pH is studied on microporous silica-based (SiOCH) and mesoporous methylsilsesquioxane (MSQ) based low-k materials. The surface and bulk properties of as-deposited and O2/CF4 plasma-treated low-k films have been studied after several wet treatments.
科研通智能强力驱动
Strongly Powered by AbleSci AI
cdercder
科研小民工
昏睡的蟠桃
SYLH
彭于彦祖
fjh
劲秉
pluto
子车茗
iNk
Qianbaor68
nozero
迷人秋烟
HEIKU
FBI911
back you up
buchirou
kingwill
斯寜
zho
皖公网安备34019202002308
