钝化
非阻塞I/O
钙钛矿(结构)
材料科学
氧化镍
串联
光电子学
化学工程
能量转换效率
图层(电子)
氧化物
纳米技术
冶金
催化作用
复合材料
化学
工程类
生物化学
作者
Shynggys Zhumagali,Furkan H. Isikgor,Partha Maity,Jun Yin,Esma Ugur,Michele De Bastiani,Anand S. Subbiah,Alessandro J. Mirabelli,Randi Azmi,George T. Harrison,Joel Troughton,Erkan Aydın,Jiang Liu,Thomas G. Allen,Atteq ur Rehman,Derya Baran,Omar F. Mohammed,Stefaan De Wolf
标识
DOI:10.1002/aenm.202101662
摘要
Abstract Sputtered nickel oxide (NiO x ) is an attractive hole‐transport layer for efficient, stable, and large‐area p‐i‐n metal‐halide perovskite solar cells (PSCs). However, surface traps and undesirable chemical reactions at the NiO x /perovskite interface are limiting the performance of NiO x ‐based PSCs. To address these issues simultaneously, an efficient NiO x /perovskite interface passivation strategy by using an organometallic dye molecule (N719) is reported. This molecule concurrently passivates NiO x and perovskite surface traps, and facilitates charge transport. Consequently, the power conversion efficiency (PCE) of single‐junction p‐i‐n PSCs increases from 17.3% to 20.4% (the highest reported value for sputtered‐NiO x based PSCs). Notably, the N719 molecule self‐anchors and conformally covers NiO x films deposited on complex surfaces. This enables highly efficient textured monolithic p‐i‐n perovskite/silicon tandem solar cells, reaching PCEs up to 26.2% (23.5% without dye passivation) with a high processing yield. The N719 layer also forms a barrier that prevents undesirable chemical reactions at the NiO x /perovskite interface, significantly improving device stability. These findings provide critical insights for improved passivation of the NiO x /perovskite interface, and the fabrication of highly efficient, robust, and large‐area perovskite‐based optoelectronic devices.
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