Effect of low temperature oxygen plasma treatment on microstructure and adhesion force of graphene

Graphene has attracted strong attention due to its unique mechanical, electrical, thermal and magnetic properties. In this work, we investigate the effect of low temperature oxygen plasma treatment on microstructure and adhesion force of single-layer graphene (SLG). Low temperature oxygen plasma is used to treat SLG grown by chemical vapor deposition through varying the exposure time. Raman spectroscopy, X-ray photoelectron spectroscopy and atomic force microscopy are utilized to identify changes before and after treatment. Raman spectra of treated graphene reveal that peak intensity of the characteristic D and D’ peaks increase. Meanwhile, degradation of the G and 2D peaks in X-ray photoelectron spectroscopy indicates that abundant COH and CO functional groups are introduced into graphene after treatment. AFM investigation shows that surface roughness and adhesion force of treated graphene increase significantly firstly and then slowly. Therefore, this work would offer a practical route to improve the performance of graphene-based devices.