激子
六方氮化硼
材料科学
应变工程
光致发光
光电子学
拉伤
纳米技术
声子
氮化硼
石墨烯
凝聚态物理
物理
医学
硅
内科学
作者
Y. L. Hsieh,Zhen‐You Lin,S.K.H. Fung,Wen-Shin Lu,Sheng-Chin Ho,Siang-Ping Hong,Sheng‐Zhu Ho,Chiu-Hua Huang,Kenji Watanabe,Takashi Taniguchi,Yang‐Hao Chan,Yi‐Chun Chen,Chung‐Lin Wu,Tse‐Ming Chen
出处
期刊:Nano Letters
[American Chemical Society]
日期:2023-06-22
卷期号:23 (15): 7244-7251
被引量:7
标识
DOI:10.1021/acs.nanolett.3c01208
摘要
Strain engineering has quickly emerged as a viable option to modify the electronic, optical, and magnetic properties of 2D materials. However, it remains challenging to arbitrarily control the strain. Here we show that, by creating atomically flat surface nanostructures in hexagonal boron nitride, we achieve an arbitrary on-chip control of both the strain distribution and magnitude on high-quality molybdenum disulfide. The phonon and exciton emissions are shown to vary in accordance with our strain field designs, enabling us to write and draw any photoluminescence color image in a single chip. Moreover, our strain engineering offers a powerful means to significantly and controllably alter the strengths and energies of interlayer excitons at room temperature. This method can be easily extended to other material systems and offers promise for functional excitonic devices.
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