碳化硼
材料科学
溅射沉积
硼
残余应力
复合材料
沉积(地质)
冶金
碳化硅
溅射
腔磁控管
薄膜
纳米技术
地质学
古生物学
化学
有机化学
沉积物
作者
Gregory Taylor,L. B. Bayu Aji,S. J. Shin,J. H. Bae,A. M. Engwall,S. O. Kucheyev
出处
期刊:Journal of vacuum science & technology
[American Vacuum Society]
日期:2024-05-30
卷期号:42 (4)
摘要
Boron carbide coatings deposited by sputtering with conventional planar magnetrons exhibit nodular growth defects. Here, we demonstrate that the density of nodular defects in B4C films can be greatly reduced by using a full-face-erosion magnetron source that achieves a more uniform target erosion by sweeping the confining magnetic field over the target surface. We systematically study properties of B4C films deposited on substrates with different tilt angles and demonstrate deposition of ultrathick films with compressive residual stress below 200 MPa.
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