Templated Self-Assembly of ZnO Films on Monolayer Patterns with Nanoscale Resolution

Lithographically defined self-growing ZnO films were prepared by a bioinspired chemical bath deposition technique (CBD). We observed a high selectivity of ZnO deposition: Teflon-like per-fluoro-decyl-trichlorosilane (FDTS) monolayers repelled ZnO primary particles, whereas amino-functionalized areas of the substrate were selectively covered by a highly anisotropic, oriented, and compact ZnO film with a thickness of 50 nm. The size of the primary particles in our methanol-based solution was approximately 2.5 nm. On the amino substrate they formed agglomerates not larger than 30 nm. Monolayer patterns made by polymer blend lithography were templated with an edge resolution of 30 nm. By using a specialized derivative of microcontact printing, we prepared layout-defined silane templates, which reliably determined the growth of a layout-defined, patterned oxide film with submicrometer lateral resolution.