材料科学
基质(水族馆)
结晶度
氮化物
氮化铝
光电子学
铝
带隙
气相
纳米技术
复合材料
图层(电子)
海洋学
物理
热力学
地质学
作者
Robert T. Bondokov,Kasey Hogan,Griffin Q. Norbury,Justin Mark,Sean P. Branagan,Naoki Ishigami,James R. Grandusky,Jianfeng Chen
出处
期刊:ECS transactions
[The Electrochemical Society]
日期:2022-09-30
卷期号:109 (8): 13-19
被引量:2
标识
DOI:10.1149/10908.0013ecst
摘要
Aluminum nitride (AlN) substrates with diameter of 2-inch are available at large quantities. The further commercialization of the AlN as a substrate for the ultra-wide bandgap (UWBG) electronics depends on its size (≥ 100 mm), cost, and substrate properties. We developed a method based on the Physical Vapor Transport (PVT) capable of growing large AlN bulk crystals. The resulting AlN substrate diameter was increased from 2-inch to 3-inch. The 3-inch AlN is viewed as intermediate phase for realization of 100 mm AlN. The 3-inch AlN substrate exhibit very good crystallinity and excellent UV transparency.
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