A study of structural effect on the spectral property of metallic cross-hole array in mid-infrared wavelengths

平版印刷术 电子束光刻 纳米光刻 材料科学 光学 透射率 下一代光刻 波长 红外线的 模版印刷 光电子学 极紫外光刻 抵抗 制作 纳米技术 物理 病理 医学 替代医学 图层(电子)
作者
Jinyu Guo,Tao Liu,Shuoqiu Tian,Wentao Yuan,Rui Zheng,Shan Wu,Ding Zhao,Yifang Chen,Min Qiu
出处
期刊:Microelectronic Engineering [Elsevier BV]
卷期号:274: 111966-111966 被引量:2
标识
DOI:10.1016/j.mee.2023.111966
摘要

Based on the earlier success in developing multichannel detection in long (8–14 μm) infrared wavelengths, this paper reports our recent progress for spectral filters in the mid-infrared band of 4–10 μm by introducing a new design with metallic cross annular hole array. The effects of structural dimensions on filtering performance were investigated by numerical simulations with the finite-difference time-domain method and experimentally verified by optical characterizations of fabricated filters made by electron beam lithography. The transmission peaks were optimized with the maximum transmittance of 62%. The existing problem of low spectral resolution of transmittances was tackled by using a thick Au film for the filter, which remains a big challenge for conventional electron beam lithography. By modeling ice lithography in amorphous solid water for constructing the filter, it was found that ice lithography certainly possesses significant advantage in replicating nanoscale features with high aspect ratio. The proposed ice lithography in this work provides an effective solution for the nanofabrication of high performance filters with dense elements in an array in the mid-infrared wavelengths.

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