Hole-Selective SiNx and AlOx Tunnel Nanolayers for Improved Polysilicon Passivating Contacts
材料科学
工程物理
光电子学
纳米技术
物理
作者
Shona McNab,Audrey Morisset,Sofia Libraro,Ezgi Genç,Xinya Niu,Jack E. N. Swallow,Peter R. Wilshaw,Robert S. Weatherup,Matthew Wright,Franz‐Josef Haug,Ruy S. Bonilla
出处
期刊:ACS applied energy materials [American Chemical Society] 日期:2024-11-14卷期号:7 (22): 10259-10270
A highly efficient hole-selective passivating contact remains the crucial step required to increase the efficiency of polysilicon-based Si solar cells. The future development of solar modules depends on a device structure that can complement the electron-selective tunnel oxide passivating contact with an equivalent hole-selective contact. We investigate plasma enhanced chemical vapor deposited (PECVD) SiN