材料科学
小型化
互连
可靠性(半导体)
电子包装
数码产品
纳米技术
碳纳米管
纳米孔
集成电路封装
集成电路
复合材料
计算机科学
电气工程
工程类
计算机网络
功率(物理)
物理
光电子学
量子力学
作者
Waqas Saeed,Z. Liu,Rubin Yan,Yuejun Li,Hongsheng Xu,Ye Tian,Xing Chen,Wei Liu
标识
DOI:10.1016/j.matdes.2024.113166
摘要
The continuous drive for miniaturization and enhanced functionality in micro-electronic devices demands highly integrated circuit (IC) packaging. This trend leads to a dense network of micro-electronic packaging interconnections, facilitated by the reduction in traditional solder interconnection sizes. However, these advancements bring about significant challenges, including thermal expansion differences between materials used in the package and the presence of non-planar substrates. Such issues can lead to thermomechanical stresses in interconnections and warpage, resulting in serious reliability issues. In response, nanostructured compliant interconnections have emerged as a promising solution. These interconnections effectively manage thermal expansion variations and substrate non-coplanarity, mitigating the risks associated with miniaturization and high integration demands in IC packaging. This review explores the latest trends and advancements in developing nanostructured compliant interconnections for modern micro-electronics. The focus is on integrating various interconnection materials, including nanoparticles (via sintering), nanoporous materials, nanowires (NWs) and carbon nanotubes (CNTs). This integration aims to improve the performance and mechanical reliability of interconnections under extreme thermal loading conditions. Advanced bonding techniques and their significant impacts on interconnection reliability are also discussed. Additionally, the study provides insights into future developments of nanostructured compliant interconnections, guiding researchers toward specific technical areas for future exploration.
科研通智能强力驱动
Strongly Powered by AbleSci AI