Layer Area, Few-Layer Graphene Films on Arbitrary Substrates by Chemical Vapor Deposition

ADVERTISEMENT RETURN TO ISSUEPREVAddition/CorrectionNEXTORIGINAL ARTICLEThis notice is a correctionLayer Area, Few-Layer Graphene Films on Arbitrary Substrates by Chemical Vapor DepositionAlfonso Reina, Xiaoting Jia, John Ho, Daniel Nezich, Hyungbin Son, Vladimir Bulovic, Mildred S. Dresselhaus, and Jing Kong*Cite this: Nano Lett. 2009, 9, 8, 3087Publication Date (Web):July 7, 2009Publication History Published online7 July 2009Published inissue 12 August 2009https://doi.org/10.1021/nl901829aCopyright © 2009 American Chemical SocietyRIGHTS & PERMISSIONSArticle Views7645Altmetric-Citations134LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InReddit PDF (43 KB) Get e-AlertsSUBJECTS:Chemical vapor deposition,Insulators,Layers,Two dimensional materials Get e-Alerts